IMP-EPD

IMP-EPD

A system for ion etch control and optimum process quality

The IMP-EPD is a differentially pumped, ruggedised secondary ion mass spectrometer for the analysis of secondary ions from the ion beam etch process. The system includes integrated software with process specific algorithms developed for optimum process control.

🛑 Overview

The IMP-EPD is a differentially pumped, ruggedised secondary ion mass spectrometer for the analysis of secondary ions from the ion beam etch process. The system includes integrated software with process specific algorithms developed for optimum process control.

The IMP-EPD system is a proven process for the production of high specification thin film devices for applications including magnetic thin films, high temperature superconductors and III-V semiconductors.

🛑 Features

• High Sensitivity SIMS / MS with Pulse Ion Counting Detector

• Quadrupole Triple filter, 300 amu mass range is standard

• Differentially Pumped Manifold With Mounting Flange to Process Chamber

• Ion Optics with Energy Analyzer and integral ioniser

• Penning Gauge and interlocks to provide over pressure protection

• Data System with integration to the process tool

• Stability (less than ± 0.5% height variation over 24 h)

• MASsoft control via RS232, RS485 or Ethernet LAN

• Programmable DDE, Parallel Digital I / O, RS232 Scripting Communication

🛑 Applications

• End point analysis

• Target impurity determination

• Quality control / SPC

• Residual gas analysis

• Leak detection