RGA Series

RGA Series

Systems for the examination of components present in a vessel or evolved from a process

With partial pressure measurement range from UHV up to 0.01 Pa (10-4 mbar).

 Sampling systems with differential pumping extend the sampling pressure range for vacuum process monitoring, and gas analysis applications when required.

 All Hiden residual gas analyzers are application tested and calibrated to provide the highest quality performance, and they are backed by a 3 year warranty and lifetime service support.

🛑 Overview

The Hiden RGA Series includes three specification levels:

HALO RGA – for residual gas analysis

Suitable for vacuum fingerprint analysis, leak detection and trend analysis

3F Series RGA – triple filter mass spectrometers for analytical applications

Triple filter technology provides extended mass ranges, increased mass resolution, enhanced sensitivity and improved contamination resistance for more demanding analytical applications.

3F-PIC – pulse ion counting detection for fast event studies

Ultra-fast pulse ion counting detection provides seven decade continuous dynamic range with optimum sensitivity at UHV/XHV

🛑 Features

• Mass range options: 50, 100, 200, 300, or 510 amu.

• Detector options give sensitivity for high vacuum to ultra high vacuum, UHV.

• Stability (less than ±0.5% height variation over 24 h)

• MASsoft control via RS232, USB or multiple systems via Ethernet LAN

• Fast access for Histogram, Trend Analysis and Analog peak displays

• Mixed mode scanning e.g. Trend, Histogram and Analog peaks in multiple-windows

• Simultaneous real time display of graphical and tabular trend analysis data

• Cursor for peak height identification under mouse control

• Real time background subtract, Automatic mass scale alignment

• Data export facility to ASCII format and to all Windows devices

• netMASsoft, an on board web server for RGA operation from your Web browser

🛑 Applications

• Residual gas analysis

• Leak detection

• Desorption

• Outgassing studies

• Bakeout cycles

• Pump Performance

• Process gas contaminants