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Mass Spectrometer for Residual Gas Analysis

  

Analysis of gas and vapour species in vacuum chambers and processes

Mass spectrometers for residual gas analysis

RGA Series

For the examination of components

present in a vessel or evolved from a

process

Ion Source Options

A range of electron impact ion sources 

that can be supplied with any of our

RGAs

HMT

A dual mode RGA system for vacuum

diagnostics and process monitoring 

HAL 201 RC

A Residual Gas Analyser configured for

demanding UHV applications

HALO 201 MBE

For molecular beam epitaxy applications

XBS

An MBE deposition flux rate monitor

qRGA

For tokamak/torus fusion research

3F Series 1000/2000 RGA

For high precision scientific and process

applications

3F-PIC

Transient mass spectrometer for fast

event UHV studies

EPIC

A system for UHV analysis of neutrals,

radicals and ions

IDP

A system for analysis of ions, neutrals

and radicals in UHV desorption studies

 

 

 Contact us for more informations   

Mass Spectrometer for Residual Gas Analysis

 

RGA Series

Systems for the examination of components present in a vessel or evolved from a process

Measures the concentration of gases and vapours in real time
HAL 3F

Mass range

50, 300 or 510 amu

Minimum detectable

concentration (HALO)

2X10-13 mbar

Minimum detectable

concentration (3F)

2X10-14 mbar

Minimum detectable

concentration (3F-PIC)

2X10-15 mbar

Ion Source

Range of electron impact

ion source types available

Ion Source control

Yes

Electron emission

Software variable 1µA to 2mA

Electron energy

Software variable 0V to 150 eV

Ion energy

Software variable 0V to 10 eV

Detector

Faraday cup and electron multiplier

Mounting flange (HALO)

DN-35-CF (2.75"/70mm OD Conflat type)

Mounting flange

(3F – Triple Filter)

DN-63-CF (4.5”/114mm OD Conflat type)

 

Ion Source Options

A range of electron impact ion sources that can be supplied with any of our residual gas analysers

Configures residual gas analysers for specific applications, molecular beam analysis for example
RGA Source

Standard RGA

A radially symmetric configuration

for general applications

UHV Low Profile

Optimised for UHV TPD

Studies

Closed Source

For direct gas input with differential

pumping stage for the analyser

XBS Cross Beam

For MBE deposition rate monitoring

and control

Basic Cross Beam

Use where the beam may be liable to

condense on ioniser surfaces

Laser Cross Beam

2 orthogonal unobstructed pathways

for laser photon ionisation

4 Lens Ion Optics

with Integrated Ioniser

For electron, photon and laser

stimulated desorption studies

Platinum Ion Source

For improved operation in

reactive gases

Gold Plated Ion Source

To minimise the effects of

source outgassing at UHV

 

HMT

A dual mode RGA system for vacuum diagnostics and process monitoring without differential pumping

Measures the residual gases, process contaminates and provides for leak detection
HMT

Mass range

100 amu

HMT - high pressure

RGA mode

Operation to 5 x 10-3 mbar

RGA - mode

Detection to 2 X 10-13 mbar

Leak detection mode

Set to use helium search

gas as standard

Mounting flange

DN-35-CF (70mm OD

Conflat type)

Detector (Standard)

Faraday cup

Detector (Optional) 

Electron multiplier

 

 

  
  

 

HAL 201 RC

A Residual Gas Analyser configured for demanding UHV applications

Measures the concentration of gases and vapours in real time
RGA gold source

Mass range

200 amu

Minimum detectable

concentration

5 x 10-14 mbar

Ion Source

Gold plated ion source

Ion Source control

Yes

Electron emission

Software variable 1µA to 2mA

Electron energy

Software variable 0V to 150 eV

Ion energy

Software variable 0V to 10 eV

Detector

Faraday cup and

electron multiplier

Mounting flange

DN-35-CF (2.75"/70mm OD

Conflat type)

 

HALO 201 MBE

A residual gas  system configured for molecular beam epitaxy applications

Measures residual gases and provides for contamination and leak detection in MBE systems
HALO 201 MBE

Mass range

200 or 300 amu

Minimum detectable

partial pressure

2 x 10-13 mbar

Leak detect mode

Set to use helium search

gas as standard

Detector

Faraday cup and

Electron multiplier

Quadrupole gauge construction

configured for MBE

Yes

Molybdenum gauge wiring

instead of copper

Yes

Ion source shroud to prevent

contamination

Yes

Thermal extender for RGA

operation during bakeout

Yes (Optional)

Mounting flange

DN-35-CF (70mm OD

Conflat type)

 

XBS

A system for multiple source monitoring in MBE deposition applications

For molecular beam analysis and deposition control
XBS

Mass range

320 or 510 amu

Cross beam ion source

CAD configured multiple

X-beam source

Beam acceptance angle

+/- 35 degree to axis

Growth rate determination 

Typically < 0.01 Angstrom / second

Leak detect mode

Set to use helium search gas

as standard 

Deposition rate monitoring

Analogue outputs for

control- 4, 8 or 16 channels

Z - drive option 

Liner drive option for

precise positioning

Water cooled shroud option 

Yes (protects against

radiant heat sources)

Detector 

Faraday cup and

Electron multiplier

 

qRGA

A system for tokamak/torus fusion research

Measures the concentration of fusion fuel gas purity including hydrogen isotopes, deuterium in helium for example
qRGA

Mass range

200 amu

Minimum detectable

concentration

Sub PPM

detection levels

Dual mode operation

Conventional RGA, TIMS

APSI -MS Appearance

potential soft ionisation

Yes

Automatic operation

Yes

Template driven software

Yes

Quantitative data output

Yes

Mounting flange

DN-35-CF (70mm OD

Conflat type)

Detector

Faraday cup and electron

multiplier

 

3F Series 1000/2000 RGA

A system for high precision scientific and process applications

Measures the partial pressures of residual gases with ultra high resolution and extended mass range options to 1000 AMU
3F Series 1000/2000 RGA

Mass range

50, 300, 510, or 1000 amu

Minimum detectable

concentration

2 x 10-14  mbar 

Ion Source

Range of electron impact ion

source types available

Ion Source control

Yes

Electron emission

Software variable 1µA to 2mA

Electron energy

Software variable 0V to 150 eV

Ion energy

Software variable 0V to 10 eV

Detector

Faraday cup and electron multiplier

Mounting flange

DN-100-CF (6"/150mm OD Conflat type)

9mm rod diameter

systems adaptor

DN-63-CF (4.5”/114mm OD Conflat type)

 

3F-PIC

A system for fast event UHV studies

Measures the partial pressures of species at UHV with pulse ion counting detection
UHV TPD

Mass range

50, 300 or 510 amu

Minimum detectable

partial pressure

5 X 10-15 mbar: 1X10-16 mbar

Fast data acquisition

 > 500 measurements/second

Low profile ion source

Optimised for desorption

studies

Signal gating input

100 nano second signal

gating resolution

Ion Source control

Yes

  
  
  

 

EPIC

A system for UHV analysis of neutrals, radicals and ions

Measures the ions, neutrals,  and partial pressures in UHV/XHV
EPIC

Mass range

50, 300, 510, 1000, or 2500 amu

Pulse ion counting detector

Positive and negative 

ion detection

DMM-dynamic multi mode

Uniquely applied for the electron

attachment ionization technique

for electronegative gas studies

Minimum detectable

partial pressure

5 X 10-15 mbar : 1X10-16 mbar

Fast measurement speed

Up to 500 measurements

per second

  
  
  
  

 

IDP

A system for analysis of ions, neutrals and radicals in UHV desorption studies

Measures ions and neutrals in electron and photon stimulated desorption
IPD

Mass range

50, 300, 510, 1000, or 2500 amu

Pulse ion counting

detector

Positive and negative ion detection

Integral IDP ion optics

Optimised for low energy ion

detection in ESD or PSD studies.

DMM-dynamic multi mode

uniquely applied for the electron

attachment ionization technique

for electronegative gas studies

External pulse gating input 

100 nano second signal gating

resolution

  

 

 

  Contact us for more informations   

 

 Επιστροφή
Κεντρικά: Σταματίου Ψάλτου 30, 54644 Θεσσαλονίκη, Τηλ.: (+30) 2310-855844, Φαξ: (+30) 2310-886206
Υποκατάστημα: Μομφεράτου 131, 11475 Αθήνα, Τηλ.: (+30) 210-6452848, Φαξ: (+30) 210-6452413, www.megalab.gr, contact@megalab.gr

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